Nano-Device Process Laboratory

나노소자공정연구실

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Prof. Kim's main research interests include the developments of the process technology for nanoscale thin films and nano-materials using atomic layer deposition (ALD) and area-selective ALD (AS-ALD), and their applications into the advanced Cu metallization and emerging interconnects technology for semiconductor devices.

Major research field

Desired field of research

Research Keywords and Topics

atomic layer deposition, area-selective atomic layer deposition, metallization, thin film deposition, H2 production, transmission electron microscopy

Research Publications

1. Adv. Funct. Mater. (2022), 32, 2206667, "Atomic Layer Deposited RuO2 Diffusion Barrier for Next Generation Ru-Interconnects" https://doi.org/10.1002/adfm.202206667
2. Chem. Mater. (2022), 34, 1533−1543, “Atomic Layer Deposition of Iridium Using a Tricarbonyl Cyclopropenyl Precursor and Oxygen”, https://doi.org/10.1021/acs.chemmater.1c03142 (selected as a front cover)
3. Chem. Mater. 2021, 33, 5639−5651, "Atomic Layer Deposition of Ru for Replacing Cu-interconnects", . https://doi.org/10.1021/acs.chemmater.1c01054

Patents

1. 루테늄 박막 형성 방법, 김수현, 이현정, 나베야 슌이치, 2019.04.23 (KR 10-1973549)
2. 원자층 증착법에 의한 박막 형성 방법, 이를 포함하는 반도체 소자의 배선 및 그 제조 방법, 천태훈, 김수현, 2012. 10. 26, (KR 10-1196746).

국가과학기술표준분류

  • EB. 재료
  • EB06. 열·표면처리
  • EB0603. 박막제조기술

국가기술지도분류

  • 정보-지식-지능화 사회 구현
  • 010400. 반도체/나노 신소자 기술

녹색기술분류

  • 에너지원기술
  • 수소/연료전지
  • 241. 고효율 수소제조기술

6T분류

  • NT 분야
  • 나노소재
  • 030212. 기타 나노소재기술