Professor Soo-Hyun Kim’s current research interests and topics are focused on developments of the process technology for nanoscale thin films using atomic layer deposition (ALD) and area-selective ALD (AS-ALD), and their applications into the advanced Cu metallization, emerging interconnects technology for semiconductor devices. He is also focusing on the development of advanced nanomaterials using ALD for clean energy conversion, storing, and sensing. For the successful development of ALD process, suitable precursors with excellent properties such as high vapor pressure, thermal stability, high reactivity with the reactant etc. are necessary and the new ALD precursor development for high-performance ALD process is one of his research topics.